Abstract: This paper describes two advanced technologies recently adopted in back-end-of-line (BEOL) process for our logic products: self-aligned-universal-patterning (SAUP) and sacrificial oxide ...
Amphibian life and the creative process were topics of discussion Jan. 9 at Horse Creek Academy, with a local ...
Abstract: In this manuscript, an experimental study to optimize the tungsten (W) deposition process was carried out to address the poor fill seam issue and to improve the contact resistance in CMOS ...
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