Intel installed and started using two High-NA EUV lithography tools from ASML at its D1 development fab near Hillsboro, ...

Intel delays chip fabrication plant debut in Ohio until 2030/2031 due to financial troubles. Stock down 43% in past year, new ...

Intel announced that its new ASML lithography machines are now in production, after a 7-year delay, to produce smaller and ...

The first phase of the facility, known as Mod 1, should be finished in 2030, with chip production beginning between 2030 and ...

Intel kept up a steady pace with the manufacture of 30,000 wafers.ts most recent high-NA EUV machines nearly match the ...

Twice as reliable Troubled Chipzilla has officially put ASML’s next-generation high-numerical-aperture (NA) lithography ...

Demand for AI chips is growing exponentially, but costs and complexity limit the technology to a handful of companies. That ...

Intel says that its two High-NA EUV lithography machines are in use and are an improvement over the OG EUV equipment.

ASML’s dominance in the semiconductor manufacturing sector is unchallenged. The company holds a near-monopoly on extreme ultraviolet (EUV) lithography, the cutting-edge technology that is ...

E-test results obtained on 20nm pitch metal line structures patterned after single-exposure High NA EUV lithography.

ASML’s dominance in the semiconductor manufacturing sector is unchallenged. The company holds a near-monopoly on extreme ...

Intel has started using two leading-edge ASML High-NA Twinscan EXE:5000 EUV lithography tools, the company revealed on Monday at an industry conference, Reuters reports. The company uses these ...