As designs transition from 130nm to 90nm and below, designers must consider manufacturing effects early in the design cycle. Shrinking design nodes, larger designs, and expanding design complexity ...
With nanometer processes, silicon success depends on the designer's ability to anticipate manufacturing concerns before tapeout. To achieve acceptable yield (or even working silicon), designers must ...
Manual and automated IC-layout tools are integrated in the PEYE Yield Finder analysis software. The combined yield-driven, standard-cell, design optimization flow facilitates the application of design ...
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